The OCTOARC coating system is highly flexible and its construction can be easily modified according to any individual requirements of customer. The basic version of the OCTOARC system is offered with five advanced arc evaporation cathodes fsARC® and can also be supplied in a combination with cathodes for magnetron sputtering. The system thus provides vast possibilities to combine seven component coatings from pure elemental targets (e.g. 5 arc and 2 DC/HiPIMS) according to the needs of any our customer, e.g. Ti, Al, Cr, Nb, Ta, Zr, Mo, W, Si and corresponding to deposition of nitrides, carbides or oxides.
| Model | OCTOARC Arc300 | OCTOARC Arc700 |
| Dimensions of equipment in mm (L x W x H) | 3800x1500x2000 | 3800x1500x2200 |
| Active plasma volume in mm | d500 x 300 | d500 x 700 |
| fsARC® cathodes | 3 – 5 | 9 – 15 |
| ARC Power Supply | Up to 200 A | Up to 200 A |
| Gas types | Ar, N2, O2, C2H2 | Ar, N2, O2, C2H2 |
| Main power | 50 [kW] / 3x400 [V] / 50 [Hz] | 110 [kW] / 3x400 [V] / 50 [Hz] |
| Substrate table | 8 x d130 mm | 24 x d130 mm |
| Load mass | 150 kg | 400 kg |
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| DC / HiPIMS magnetrons (optional) with dimensions in mm | 2 254 x 127 x 12 | 2 510 x 127 x 12 |
| DC magnetron Power supply (optional) HiPIMS Power Supply (optional) | 5-10 [kW] 1-2 [MW] | 5-10 [kW] 1-2 [MW] |
| Max capacity of rotary tools: | ||
| End mills d20 x 150 mm | 112 | 416 |
| Inserts 15 x 15 x 5 mm | 1768 | 7072 |
| Target costs per tool | TiAlN – 0,03 EUR | TiAlN – 0,015 EUR |
| For end mill d20 x 150 | TiAlSiN – 0,04 EUR | TiAlSiN – 0,02 EUR |
OCTOARC Arc500
View into deposition chamber of OCTOARC system.
Basic types of coatings made at OCTOARC Arc
STATON,s.r.o., offers several different PVD coatings specially developed for various applications. Hard PVD coatings reduce wear and friction and thus enhance productivity, tool lifetime and quality of machining.
| OCTOARC system – Coatings | |||||
| Coating type | Hardness [GPa] | Hardness [HV0.05] | Thickness [µm] | Coefficient of friction | Thermal stability [°C] |
| CrN | 21 | 2140 | 1 – 4 | 0.6 | 700 |
| TiN | 23 | 2350 | 1 – 4 | 0.4 | 500 |
| TiCN | 27 | 2750 | 1 – 4 | 0.2 | 450 |
| TiAlN | 32 | 3260 | 1 – 4 | 0.5 | 600 |
| TiAlCN | 29 | 2960 | 1 – 4 | 0.4 | 500 |
| KTRN | 34 | 3470 | 1 – 4 | 0.4 | 900 |
| CRONAL | 30 | 3060 | 1 – 4 | 0.5 | 1000 |
| TiSiN | 35 | 3570 | 1 – 4 | 0.6 | 1100 |
fsARC® - new modified arc evaporator
The OCTOARC system is now being delivered with a novel upgraded arc cathode fsARC® with advanced control of cathode spot movement (Fig. 1). The main advantage of the modified cathode fsARC® lies in the elimination of formation of large microdroplets which typically form during arc operation on the surface of the evaporated target. The resulting coatings are smoother and of a better quality as compared to typical arc coatings containing substantial amount of droplets (Fig. 2). The elimination of formation of large microdroplets is the basic condition for taking advantage of a combination of deposition techniques of arc evaporation and magnetron sputtering in a single process. This brings along also the advantage of a possible use of HiPIMS technology for deposition of coatings with fine surfaces and denser structure with better properties and performance.
Fig. 1. Cathode spot movement on the surface of a target controlled using modified arc evaporator.
Fig. 2. TiN coatings prepared at the same deposition conditions using standard arc technology (left) and using the novel modified fsARC® cathode system (right).